This study is aimed at investigating the performance of an advanced GaN HEMT technology for millimeter-wave applications. Both DC and frequency-dependent measurements are performed on three multifinger on-wafer 0.15-µm transistors with different gate widths at different ambient temperatures for foreseeing GaN technology capability when applications require challenging frequency operation.

mm-Wave GaN HEMT Technology: Advances, Experiments, and Analysis

Bosi G.;Raffo A.;Vannini G.
Ultimo
2022

Abstract

This study is aimed at investigating the performance of an advanced GaN HEMT technology for millimeter-wave applications. Both DC and frequency-dependent measurements are performed on three multifinger on-wafer 0.15-µm transistors with different gate widths at different ambient temperatures for foreseeing GaN technology capability when applications require challenging frequency operation.
2022
9781665471107
gallium nitride (GaN); high-electron-mobility transistor (HEMT); millimeter-wave frequency; multifinger layout; scattering parameter measurements; temperature)
File in questo prodotto:
File Dimensione Formato  
raffo1.pdf

solo gestori archivio

Tipologia: Full text (versione editoriale)
Licenza: NON PUBBLICO - Accesso privato/ristretto
Dimensione 480.14 kB
Formato Adobe PDF
480.14 kB Adobe PDF   Visualizza/Apri   Richiedi una copia

I documenti in SFERA sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11392/2492914
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 2
  • ???jsp.display-item.citation.isi??? 2
social impact