This study is aimed at investigating the performance of an advanced GaN HEMT technology for millimeter-wave applications. Both DC and frequency-dependent measurements are performed on three multifinger on-wafer 0.15-µm transistors with different gate widths at different ambient temperatures for foreseeing GaN technology capability when applications require challenging frequency operation.

mm-Wave GaN HEMT Technology: Advances, Experiments, and Analysis

Bosi G.;Raffo A.;Vannini G.
2022

Abstract

This study is aimed at investigating the performance of an advanced GaN HEMT technology for millimeter-wave applications. Both DC and frequency-dependent measurements are performed on three multifinger on-wafer 0.15-µm transistors with different gate widths at different ambient temperatures for foreseeing GaN technology capability when applications require challenging frequency operation.
2022
978-1-6654-7110-7
gallium nitride (GaN)
high-electron-mobility transistor (HEMT)
millimeter-wave frequency
multifinger layout
scattering parameter measurements
temperature
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11392/2492914
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