This paper describes a measurement technique suitable for the characterization of GaN-based FET devices, based on exciting the device simultaneously with low-frequency large-signal and high-frequency small-signal tones. This technique allows one to accurately characterize lowfrequency dispersion affecting this technology and at the same time the high-frequency behavior. We also discuss how to effectively use these measurements for modeling purpose.

Nonlinear Characterization of GaN Transistors under Dynamic Bias Operation

Vadalà Valeria
Primo
;
Vannini G.
Ultimo
2020

Abstract

This paper describes a measurement technique suitable for the characterization of GaN-based FET devices, based on exciting the device simultaneously with low-frequency large-signal and high-frequency small-signal tones. This technique allows one to accurately characterize lowfrequency dispersion affecting this technology and at the same time the high-frequency behavior. We also discuss how to effectively use these measurements for modeling purpose.
2020
9789463968003
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11392/2474767
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