The method includes the following steps: formulation of liquid, non-gelled and stable precursor by solvolysis of Ti(IV) compounds; precursor deposition on endosseous implant surface; thermal treatment to achieve film densification, in the presence of oxygen, of a complex formed by the above mentioned endosseous implant and precursor, to obtain on the implant surface a thin film of nanocrystalline titanium dioxide with good mechanical and chemical stability; The complex above, under a persistent UV irradiation modify its surface status conferring a sensible increasing of wettability chemical and biological decontamination.

METHOD FOR PREPARING ENDOSSEOUS IMPLANTS WITH ANATASE TITANIUM DIOXIDE COATING.

CARINCI, Francesco;BIGNOZZI, Carlo Alberto;
2005

Abstract

The method includes the following steps: formulation of liquid, non-gelled and stable precursor by solvolysis of Ti(IV) compounds; precursor deposition on endosseous implant surface; thermal treatment to achieve film densification, in the presence of oxygen, of a complex formed by the above mentioned endosseous implant and precursor, to obtain on the implant surface a thin film of nanocrystalline titanium dioxide with good mechanical and chemical stability; The complex above, under a persistent UV irradiation modify its surface status conferring a sensible increasing of wettability chemical and biological decontamination.
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Utilizza questo identificativo per citare o creare un link a questo documento: http://hdl.handle.net/11392/524971
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