Measurements of the fluctuations in the tunneling current It through a thin SiO2 insulating layer, by means of an ultralow noise measurement set, showed that after a first time interval in which its power spectral density is stationary and proportional to I2t, an on-off modulation of It arises, just before oxide breakdown. This bistable noise seems to be related to localized phenomena controlled by trapping-detrapping processes within the oxide. Two possible mechanisms which could give rise to this bistable noise are discussed.

Low-Frequency Noise in Silicon-Gate Metal-Oxide-Silicon Capacitors Before Oxide Breakdown

OLIVO, Piero;
1987

Abstract

Measurements of the fluctuations in the tunneling current It through a thin SiO2 insulating layer, by means of an ultralow noise measurement set, showed that after a first time interval in which its power spectral density is stationary and proportional to I2t, an on-off modulation of It arises, just before oxide breakdown. This bistable noise seems to be related to localized phenomena controlled by trapping-detrapping processes within the oxide. Two possible mechanisms which could give rise to this bistable noise are discussed.
1987
B., Neri; Olivo, Piero; B., Ricco'
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11392/462039
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