We numerically analyze the etch depth as a design parameter for the realization of integrated polarization independent directional couplers. Through finite-element-method simulations, the coupling coefficients of transverse-electric (TE) and transverse-magnetic (TM) polarizations are investigated according to different etch depth levels in the coupling section of the studied device. By optimizing etching depth, the proposed coupler can perform similarly for both polarizations in broadband. According to simulation results, the minimum difference between the TE and TM coupling coefficients can be kept less than 1% in 100 nm of the wavelength range.

Analysis of Etch Depth for Polarization-free Directional Couplers

Kaplan A. E.
Primo
Formal Analysis
;
Bellanca G.
Ultimo
Methodology
2020

Abstract

We numerically analyze the etch depth as a design parameter for the realization of integrated polarization independent directional couplers. Through finite-element-method simulations, the coupling coefficients of transverse-electric (TE) and transverse-magnetic (TM) polarizations are investigated according to different etch depth levels in the coupling section of the studied device. By optimizing etching depth, the proposed coupler can perform similarly for both polarizations in broadband. According to simulation results, the minimum difference between the TE and TM coupling coefficients can be kept less than 1% in 100 nm of the wavelength range.
2020
9781728162393
directional couplers; photonic integrated circuits; polarization-independent circuits
File in questo prodotto:
File Dimensione Formato  
EMRE_ICOP09300314.pdf

solo gestori archivio

Descrizione: Articolo principale
Tipologia: Full text (versione editoriale)
Licenza: NON PUBBLICO - Accesso privato/ristretto
Dimensione 305.58 kB
Formato Adobe PDF
305.58 kB Adobe PDF   Visualizza/Apri   Richiedi una copia
icop_kaplan_final.pdf

solo gestori archivio

Descrizione: Full text ahead of print
Tipologia: Full text (versione editoriale)
Licenza: NON PUBBLICO - Accesso privato/ristretto
Dimensione 298.03 kB
Formato Adobe PDF
298.03 kB Adobe PDF   Visualizza/Apri   Richiedi una copia

I documenti in SFERA sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.

Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11392/2437178
Citazioni
  • ???jsp.display-item.citation.pmc??? ND
  • Scopus 0
  • ???jsp.display-item.citation.isi??? 0
social impact