Ti-supported RuN thin films, synthesized by rf-magnetron sputtering, have been electrochemically characterized, focusing in particular to their charge-storage capacity, and to the mechanisms that influence this important property, in view, e.g., of applications in supercapacitors. Based on cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS) data, a deconvolution of non-faradic and faradic contributions has been attempted, and a mechanism for the charging/discharging process has been proposed.

Charge-storage process of stoichiometric and nanostructured Ruthenium Nitride thin films

ROSESTOLATO, Davide;BATTAGLIN, Giancarlo;FERRO, Sergio
2015

Abstract

Ti-supported RuN thin films, synthesized by rf-magnetron sputtering, have been electrochemically characterized, focusing in particular to their charge-storage capacity, and to the mechanisms that influence this important property, in view, e.g., of applications in supercapacitors. Based on cyclic voltammetry (CV) and electrochemical impedance spectroscopy (EIS) data, a deconvolution of non-faradic and faradic contributions has been attempted, and a mechanism for the charging/discharging process has been proposed.
2015
Rosestolato, Davide; Battaglin, Giancarlo; Ferro, Sergio
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11392/2359019
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