Photodissociation of SF6 iso btained by excitation with th fourth harmonic of a Nd:YAG laser. As a result the possibility is open for applications in atomic scale etching and for resonant anhanced dissociation or spectroscopy
Photodissociation of SF6 By Nd:YAG laser in a Supersonic Molecular Beam and in Gas Cell
CIULLO, Giuseppe;
1998
Abstract
Photodissociation of SF6 iso btained by excitation with th fourth harmonic of a Nd:YAG laser. As a result the possibility is open for applications in atomic scale etching and for resonant anhanced dissociation or spectroscopyFile in questo prodotto:
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