Thin films were obtained by r.f. reactive sputtering from a Ti0.1–W0.9 target followed by heating in dry air. Their morphological and structural characteristics were studied by means of electron-microscopy techniques. Annealing at 600°C of a sample leads to a WO3 polycrystalline thin-film. A solution of Ti ions in the WO3 lattice causes the film to have higher surface-to-volume ratio and thereby higher gas-sensitivity with respect to pure WO3 sputtered thin films. This layer is highly sensitive to NO2 as concentrations lower than 1 ppm of NO2 are detected. Annealing the film at 800°C results in a TiO2-anatase nanostructured layer which is capable to detect few ppm of NO2 in dry air within the temperature range of 350–800°C.

Gas-sensing applications of W-Ti-O-based nanosized thin films prepared by r.f. reactive sputtering

FERRONI, Matteo;GUIDI, Vincenzo;MARTINELLI, Giuliano;SBERVEGLIERI, Giorgio
1997

Abstract

Thin films were obtained by r.f. reactive sputtering from a Ti0.1–W0.9 target followed by heating in dry air. Their morphological and structural characteristics were studied by means of electron-microscopy techniques. Annealing at 600°C of a sample leads to a WO3 polycrystalline thin-film. A solution of Ti ions in the WO3 lattice causes the film to have higher surface-to-volume ratio and thereby higher gas-sensitivity with respect to pure WO3 sputtered thin films. This layer is highly sensitive to NO2 as concentrations lower than 1 ppm of NO2 are detected. Annealing the film at 800°C results in a TiO2-anatase nanostructured layer which is capable to detect few ppm of NO2 in dry air within the temperature range of 350–800°C.
Ferroni, Matteo; Guidi, Vincenzo; Martinelli, Giuliano; P., Nelli; Sberveglieri, Giorgio
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11392/1203118
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