We report the characterization of thin films of MoO3 and their implementation on a micromachined silicon-based structure to achieve considerably low power consumption. The sensing layer is capable of detecting NO2 up to a few ppm with considerably short response and recovery times. Investigation of structural features of the films is carried out by X-ray diffraction and electron microscopy.

Thin-film gas sensor implemented on a low-power-comsumption micromachined silicon structure

GUIDI, Vincenzo;FERRONI, Matteo;MARTINELLI, Giuliano;
1998

Abstract

We report the characterization of thin films of MoO3 and their implementation on a micromachined silicon-based structure to achieve considerably low power consumption. The sensing layer is capable of detecting NO2 up to a few ppm with considerably short response and recovery times. Investigation of structural features of the films is carried out by X-ray diffraction and electron microscopy.
1998
Guidi, Vincenzo; G. C., Cardinali; L., Dori; G., Faglia; Ferroni, Matteo; Martinelli, Giuliano; P., Nelli; G., Sberveglieri
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11392/1203111
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