Spray pyrolysis has been widely used for the preparation of thin (approximately 0.1 micron) and transparent SnO2 films on glass substrates. The parameters of the spray pyrolysis for the preparation of thick SnO2-Sb2O5 conductive films on Ti substrates were studied for electrochemical use. The resistivity of the films exhibits a minimum for a Sb concentration of approximately 3 at.% (precursor solution concentration) and for a preparation temperature of 550 °C. As far as the composition is concerned, the Sb concentration in the oxide films is about twice as large as that in the corresponding precursor solution. The dependence of the oxide loading on the substrate temperature and nature and the influence of the spray conditions also are discussed.
Preparation of SnO2-Sb2O5 films by the spray pyrolysis technique
DE BATTISTI, Achille
1996
Abstract
Spray pyrolysis has been widely used for the preparation of thin (approximately 0.1 micron) and transparent SnO2 films on glass substrates. The parameters of the spray pyrolysis for the preparation of thick SnO2-Sb2O5 conductive films on Ti substrates were studied for electrochemical use. The resistivity of the films exhibits a minimum for a Sb concentration of approximately 3 at.% (precursor solution concentration) and for a preparation temperature of 550 °C. As far as the composition is concerned, the Sb concentration in the oxide films is about twice as large as that in the corresponding precursor solution. The dependence of the oxide loading on the substrate temperature and nature and the influence of the spray conditions also are discussed.I documenti in SFERA sono protetti da copyright e tutti i diritti sono riservati, salvo diversa indicazione.
