In this paper, an empirical characterization technique of charge-trapping effects in GaN FETs based on low-frequency measurements is proposed. It is applied on a 0.25 × 600 μm2GaN HEMT. Experimental results confirm theoretical assumptions reported in literature.

Characterization of charge-trapping effects in GaN FETs through low-frequency measurements

BOSI, Gianni;RAFFO, Antonio;NALLI, Andrea;VADALA', Valeria;VANNINI, Giorgio
2014

Abstract

In this paper, an empirical characterization technique of charge-trapping effects in GaN FETs based on low-frequency measurements is proposed. It is applied on a 0.25 × 600 μm2GaN HEMT. Experimental results confirm theoretical assumptions reported in literature.
2014
978-1-4799-3454-6
978-1-4799-3454-6
Field effect transistors (FETs); gallium nitride; semiconductor device measurements; semiconductor device modeling; trapping effects; Hardware and Architecture; Electrical and Electronic Engineering
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11392/2334635
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