The synthesis and the characterization of new cyclic and polymeric phosphazenes with interesting applicative potential in the photochemical domain is reported. In particular cyclic and polyphosphazene derivatives containing 4-tert-butoxycarbonyloxyphenoxy (BOC) residues, cyclophosphazenes substituted with dialkoxyacetophenone groups and bearing tertiary amines as side phosphorus substituents are described.

Photosensitive phosphazene substrates: synthesis and characterization

FANTIN, Giancarlo;FOGAGNOLO, Marco;MEDICI, Alessandro;PEDRINI, Paola
1997

Abstract

The synthesis and the characterization of new cyclic and polymeric phosphazenes with interesting applicative potential in the photochemical domain is reported. In particular cyclic and polyphosphazene derivatives containing 4-tert-butoxycarbonyloxyphenoxy (BOC) residues, cyclophosphazenes substituted with dialkoxyacetophenone groups and bearing tertiary amines as side phosphorus substituents are described.
1997
Fantin, Giancarlo; Fogagnolo, Marco; M., Gleria; Medici, Alessandro; F., Minto; Pedrini, Paola
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Utilizza questo identificativo per citare o creare un link a questo documento: https://hdl.handle.net/11392/1204874
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